(Dr. Jack Lackey, advisor)
"Design and Operation of a Dual-Entry Laser Chemical Vapor Deposition Rapid Prototyping System"
The current configuration of the LCVD system at Georgia Institute of
Technology receives power from a single Carbon Dioxide laser with a spot
size of approximately 200 mm. The research project
considered for investigation is the design and implementation of a dual-entry
laser subsystem for the current LCVD system that will allow an Argon laser
to enter from the side as well as the top of the reaction chamber. Currently,
the CO2 laser enters the LCVD reaction
chamber vertically from the top and on-going research is performed on vertical
builds. The proposed design will incorporate an Argon laser into the current
LCVD system without removing the CO2 laser.
The combination of both lasers will help deposit complex three-dimensional
components in shorter time. The additional benefit of the Argon laser is
a spot size of approximately 10 mm. Therefore
the Argon laser is capable of greater precision than the current CO2
laser. The addition of the dual entry system will allow for the creation
and investigation of radial builds using LCVD technology. The successful
design and implementation of the dual-entry subsystem will be a first in
the field of LCVD technology.