(Dr. Jack Lackey, advisor)

"Design and Operation of a Dual-Entry Laser Chemical Vapor Deposition Rapid Prototyping System"

Abstract

The current configuration of the LCVD system at Georgia Institute of Technology receives power from a single Carbon Dioxide laser with a spot size of approximately 200 mm. The research project considered for investigation is the design and implementation of a dual-entry laser subsystem for the current LCVD system that will allow an Argon laser to enter from the side as well as the top of the reaction chamber. Currently, the CO₂ laser enters the LCVD reaction chamber vertically from the top and on-going research is performed on vertical builds. The proposed design will incorporate an Argon laser into the current LCVD system without removing the CO₂ laser. The combination of both lasers will help deposit complex three-dimensional components in shorter time. The additional benefit of the Argon laser is a spot size of approximately 10 mm. Therefore the Argon laser is capable of greater precision than the current CO₂ laser. The addition of the dual entry system will allow for the creation and investigation of radial builds using LCVD technology. The successful design and implementation of the dual-entry subsystem will be a first in the field of LCVD technology.